ABSTRACT
In Chemical Vapor Deposition (CVD), vapor phase monomers are converted to solid polymeric thin films in a single step. 1 , 2 The benefits of CVD (Table 15.1) are distinct from solution-based or melt processing methods for forming thin polymeric layers. Thus, CVD methodologies expand the set of options available for applying organic surface modification layers. For a subset of applications, CVD polymerization represents the best, or in some cases, the only, approach. The Advantages of CVD Technology for Forming Thin Polymer Films CVD Solution Based Methods or Melt Processing Methods Free of surface-tension-induced defects ✓ Free of residual-solvent-induced defects ✓ Substrate Independent ✓a Same process on Si or on paper ✓a Avoids solvent degradation of the substrate ✓a Interfacial grafting Easy Difficult Ultrathin (<10 nm), pinhole free films Easy Difficult Conformal coverage of geometric features and ordinary rough substrates Easy Difficult Reproducible and scalable to large areas Easy Easy Tunable film characteristics and composition Easy Easy Patternable for device integration Easy, mainly by shadow mask method. Easy, inkjet printing, gravure roll printing. Mechanically flexible for roll-to-roll processing and novel device architectures Easy Easy aFor volatile oxidants, such as Br2, VOCl3, and SbCl5, oCVD is an all-dry process. For other oxidants, such as FeCl3, a post-deposition rinsing is often used.
